Description
RTP (Rubidium Titanyle Phosphate – RbTiOPO4) is a material now widely used for Electro Optical applications whenever low switching voltages are required.
RTP is an isomorph to Potassium Titanyl Phosphate (KTiOPO4, KTP), a highly efficient non-linear crystalline material. RTP single crystals are grown by a slow-cooling flux method. The saturation point at the start of crystal growth is set by using a seed-tentative method. The growth temperature ranges from 800°C to 950°C with a growth period between 45 and 60 days.
RTP crystal appealing because it is not sensitive to moisture, easy to handle and coat, and also it does not exhibit piezo-electric ringing at elevated repetition rate. Moreover, RTP exhibits high electro-optic coefficients that allow the monitoring of Pockels cell with low power voltage requirement.
As RTP is transparent from 0.4 to 3.5µm, it can be used in multiple types of laser such as Er:YAG laser at 2.94µm with fairly good efficiency. Bulk absorption measurements at 1.064µm range from 50 to 150ppm using Photothermal Common Path Interferometer.RTP has a fairly high surface damage threshold measured by SPICATEC at 15J/cm² (1064nm, 10ns, 10Hz).
