Johanna Taieb

Imagine Optic’s HASO EUV wavefront sensors offers professionals unsurpassed quality,
precision and ease of use for ultra-short wavelength beam characterization, adjustment
and alignment

Key features:

  • Working wavelength range from 4 to 45 nm, see the specification table below
  • High resolution
  • Large aperture
  • Vacuum compatible
  • Perfectly adapted for laboratory and industrial applications
  • Independent phase and intensity measurements
  • High-Numerical Aperture (NA) model now available


Imagine Optic’s HASO EUV wavefront sensor, developed in collaboration with the LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today’s demanding laboratory and industrial applications.

Designed and built in collaboration with our customers and with their needs as the top priority, the HASO EUV incorporates our patented rotated square technology to offer high spatial sampling and wide dynamic range, making it the ideal choice for HHG, EUV lithography, synchrotron and EUV-FEL beam analysis. When used for adaptive optics, the EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.
When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction. Additional add-on modules offer features including extended wavefront reconstruction and Point Spread Function (PSF), as well as a dynamic library that enables you to build your own software applications using this remarkable device.

Ask us about - HASO EUV