Description
HHG, synchrotron, EUV-FEL, new generation lithography
The HASO EUV offers unsurpassed quality, precision and ease of use for ultra-short wavelength beam characterization, adjustment and alignment.
HASO EUV
Johanna Taieb
BEST FOR
– HHG, synchrotron and EUV-FEL beam alignment and characterization
– Mirror alignment in beamlines, Bender optimization
– Stability characterization
– Schwarzschild telescope alignment and characterization
– Zoneplace characterization
– Plasma science
